Method of polishing a substrate comprising poly-silicon, silicon oxide and silicon nitride

摘要

PROBLEM TO BE SOLVED: To provide a polishing-liquid composition that improves a polishing selection ratio of a silicon oxide with respect to a silicon nitride, and a polishing method using the same.;SOLUTION: A substrate contains polysilicon, a silicon oxide, and a silicon nitride. The substrate is polished by a chemical mechanical polishing composition containing water, an abrasive, diethylenetriamine pentakis, and an alkyl aryl polyether sulfonate compound including a hydrophobic portion with an alkyl group bound to an aryl ring and a nonionic acyclic hydrophilic portion having 4 to 100 carbon atoms.;COPYRIGHT: (C)2012,JPO&INPIT