Stamping method of making an uneven layer and uneven layer

摘要

PROBLEM TO BE SOLVED: To provide an uneven layer which can be appropriately produced by an emboss processing method, and has low porosity.;SOLUTION: A method relates to a method for forming an even layer using a pressing mold 206 having a pressing mold surface 208 including a template uneven pattern. A solution having a silicon oxide compound 200 is sandwiched between a substrate surface 202 and the pressing mold surface 208, and is dried during the sandwiching. The uneven layer obtained by removing the template uneven pattern has a high inorganic mass content, is strengthened, and can be directly used for a large number of applications such as a semiconductor and an optical or fine machine.;COPYRIGHT: (C)2015,JPO&INPIT