首页>
外国专利>
Pre-shrink shape estimation method and CD-SEM apparatus
Pre-shrink shape estimation method and CD-SEM apparatus
展开▼
机译:收缩前形状估计方法和cd-sem设备
展开▼
页面导航
摘要
著录项
相似文献
摘要
In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).
展开▼