Inductively coupled plasma flood gun with a dipping low inductance RF coil and multi-cusp magnetic array

摘要

The plasma flood cancer/gun inside the ion implantation system is disclosed. As for this plasma flood cancer/gun, the plasma chamber which possesses the opening of one or more (118) with, the gas source and the coil at least can supply one gaseous substance inside the plasma chamber of the single turn which is arranged inside the plasma chamber (120) with, being the power source which is connected to this coil, making induce making Radio Frequency electric power connect, exciting the gas substance of one or more inside the plasma chamber, it has with the power source in order to generate the plasma. As for the inside of the plasma chamber, it can lose the metal content substance, it is possible not to expose the plasma to the metal component inside the plasma chamber. The plural magnets in order to control the plasma (126) to include it is possible the plasma chamber. Exit opening (124) providing inside the plasma chamber, negative number of the plasma which it occurs the particle which is electrified, the ion beam which is portion of the ion implantation system which it is related makes that it operates mutually possible. With one execution form, the side where opening opposes arranging the magnet respectively, you use in order to operate the electron of the plasma.