首页> 外文期刊>Thin Solid Films >Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units
【24h】

Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units

机译:由低电感天线单元驱动的电感耦合RF等离子体对聚合物的等离子体表面处理

获取原文
获取原文并翻译 | 示例
       

摘要

Plasma surface treatment of polymers has been carried out with argon/oxygen mixture plasmas driven by multiple low-inductance antenna units. Kinetic energy distribution of argon ions from the argon/oxygen mixture plasmas onto polymers showed considerable suppression of ion energies sufficiently less than 10 eV. Polyethyleneterephthalate (PET) films were exposed to argon/oxygen mixture plasma for 1-5 min on a water-cooled substrate holder. The etching depth of PET surface increased with increasing plasma-exposure time and the etching rate was 118 nm/min. Surface roughness of PET surface (root-mean-square value) increased from 0.5 nm to 2.7 nm with increasing plasma-exposure time from 0 min (original sample) to 5 min. Hard X-ray photoelectron spectroscopy (HXPES) was carried out for analysis of chemical bonding states of the PET surface. The HXPES analyses exhibited nano-surface modification of the PET surface without suffering degradation of molecular structures beneath.
机译:聚合物的等离子体表面处理已经由多个低电感天线单元驱动的氩/氧混合等离子体进行了。来自氩气/氧气混合物等离子体的氩离子在聚合物上的动能分布显示出对离子能量的充分抑制,该能量足以小于10 eV。将聚对苯二甲酸乙二酯(PET)膜在水冷基板支架上暴露于氩气/氧气混合物等离子体中1-5分钟。随着等离子体暴露时间的增加,PET表面的蚀刻深度增加,蚀刻速率为118nm / min。随着血浆暴露时间从0分钟(原始样品)增加到5分钟,PET表面的表面粗糙度(均方根值)从0.5 nm增加到2.7 nm。进行硬X射线光电子能谱法(HXPES)以分析PET表面的化学键合状态。 HXPES分析显示出PET表面的纳米表面改性,而不会破坏下面的分子结构。

著录项

  • 来源
    《Thin Solid Films》 |2009年第3期|1006-1011|共6页
  • 作者单位

    Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan JST, CREST, Japan;

    Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan;

    Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan JST, CREST, Japan;

    EMD Corporation, 1-36, Goryoohara-cho, Nishikyo-ku, Kyoto 615-8245, Japan;

    Department of Electronics, Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395, Japan JST, CREST, Japan;

    Plasma Nanotechnology Research Center, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan JST, CREST, Japan;

    Plasma Nanotechnology Research Center, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan JST, CREST, Japan;

    Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198 Japan;

    Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;

    Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;

    Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    inductively-coupled plasma; low-inductance antenna; polymer; low-damage process; hard X-ray photoelectron spectroscopy;

    机译:电感耦合等离子体低电感天线聚合物;低损伤过程硬X射线光电子能谱;
  • 入库时间 2022-08-17 13:44:34

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号