Raw material gas supply device, a film forming apparatus, supply method and storage medium of the raw material gas

摘要

PROBLEM TO BE SOLVED: To provide a source gas supply device or the like for stably supplying source gas of a previously set concentration to a film-deposition treatment section.;SOLUTION: A source gas supply device is used in a film deposition apparatus for depositing a film on a substrate W. A source container 3 stores a source such as liquid, and carrier gas supply sections 51 and 52 supply carrier gas to a space for storing the source in the source container 3. An extracting section 310 extracts source gas from the source container 3, and dilution gas supply sections 41 and 42 supply dilution gas to be mixed into the source gas. Based on the concentration of the source gas after dilution detected by a concentration detecting section 2, a control section 6 adjusts the flow ratio of the carrier gas or dilution gas while keeping the total flow rate of the source gas after dilution within a preset range, and adjusts the temperature so that the temperature of the source gas after the dilution gas is mixed is higher than the liquifaction temperature or the like of the source.;COPYRIGHT: (C)2014,JPO&INPIT