RAW MATERIAL GAS SUPPLY DEVICE FILM FORMING APPARATUS RAW MATERIAL GAS SUPPLY METHOD AND STORAGE MEDIUM

摘要

The present invention provides a raw material gas supply device and the like that are excellent in responsiveness and flow rate stability of a raw material gas. A raw material gas supply device according to an embodiment of the present invention is a raw material gas supply device for use in a film forming apparatus for forming a film on a substrate. The raw material gas supply device includes a raw material container containing a liquid or solid raw material, A carrier gas supply part for supplying a carrier gas; a source gas supply path for supplying a source gas containing a vaporized source from the source container to the film formation apparatus; A flow rate measuring unit for measuring a flow rate, a pressure regulating unit for regulating the pressure in the raw material container, a flow rate measuring unit for comparing the flow rate measurement value of the vaporized raw material measured by the flow rate measuring unit with a preset target value, And a control unit for controlling the pressure regulating unit so as to lower the pressure in the raw material container when the pressure in the raw material container is raised when the value is higher than the target value and the flow rate measurement value is lower than the target value do.;