Lithographic apparatus, apparatus for providing a set point data, device manufacturing method, method of calculating the set point data, and a computer program

摘要

To each location on the A target is a configuration has been exposure device to project more of the radiation beam, respectively. The plurality of radiation beams, using a plurality of spot exposures to form a desired dose pattern, the nominal position of the feature point in the dose distribution of each spot exposure is placed on a point defining a first grid. The exposure apparatus calculates the target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern. This calculation is used as input raster representation of the desired dose pattern. Raster representation may include a dose values ​​defined in each of a plurality of points on the second grid. The first grid and the second grid have the same geometry. The exposure apparatus is provided with data, or the controller has a controller that is configured to emit a beam having a target intensity value by controlling the exposure apparatus. .BACKGROUND 8