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GAS COOLED MINIMAL CONTACT AREA(MCA) ELECTROSTATIC CHUCK(ESC) FOR ALUMINUM NITRIDE(ALN) PVD PROCESS
GAS COOLED MINIMAL CONTACT AREA(MCA) ELECTROSTATIC CHUCK(ESC) FOR ALUMINUM NITRIDE(ALN) PVD PROCESS
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机译:氮化铝(PVN)工艺用气体冷却最小接触面积(MCA)静电吸盘(ESC)
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摘要
Embodiments of the disclosure include an electrostatic chuck assembly, a processing chamber and a method of maintaining a temperature of a substrate is provided. In one embodiment, an electrostatic chuck assembly is provided that includes an electrostatic chuck, a cooling plate and a gas box. The cooling plate includes a gas channel formed therein. The gas box is operable to control a flow of cooling gas through the gas channel.
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