首页>
外国专利>
NEGATIVE DEVELOPING METHOD AND NEGATIVE DEVELOPING APPARATUS
NEGATIVE DEVELOPING METHOD AND NEGATIVE DEVELOPING APPARATUS
展开▼
机译:负发展方法和负发展设备
展开▼
页面导航
摘要
著录项
相似文献
摘要
Disclosed is a negative developing method including a puddle-forming step, a diluting step, and a surface drying step. In the puddle-forming step, developer containing an organic solvent is supplied to a resist film formed on a surface of the substrate and keeping a puddle of the developer on the resist film. In the diluting step, a concentration of a dissolution product dissolved in the developer on the resist film is diluted by additionally supplying the developer containing the organic solvent to the resist film after the puddle-forming step. In the surface drying step, the surface of the substrate is dried by rotating the substrate after the diluting step.
展开▼