首页> 外国专利> Gate-tunable P-N heterojunction diode, and fabrication method and application of same

Gate-tunable P-N heterojunction diode, and fabrication method and application of same

机译:栅极可调的p-n异质结二极管及其制造方法和应用

摘要

One aspect of the invention relates to a gate-tunable p-n heterojunction diode including a vertical stacked heterojunction of two ultrathin semiconductors. In one embodiment, single-layer molybdenum disulphide of an n-type semiconductor are stacked below semiconducting single-walled carbon nanotubes of a p-type semiconductor with each of them connected to a gold electrodes to form a p-n heterojunction. The electrical properties of the p-n heterojunction can be modulated by a gate voltage applied to a gate electrode and range from an insulator to a linear-response resistor to a highly rectifying diode. The gate tunability of the p-n heterojunction also allows spectral control over the photoresponse.
机译:本发明的一个方面涉及一种栅极可调的p-n异质结二极管,其包括两个超薄半导体的垂直堆叠的异质结。在一个实施方案中,将n型半导体的单层二硫化钼堆叠在p型半导体的半导体单壁碳纳米管下方,其中每一个均与金电极连接以形成p-n异质结。 p-n异质结的电特性可以通过施加到栅电极的栅极电压进行调节,范围从绝缘体到线性响应电阻再到高度整流的二极管。 p-n异质结的栅极可调性还允许对光响应进行光谱控制。

著录项

  • 公开/公告号US9472686B2

    专利类型

  • 公开/公告日2016-10-18

    原文格式PDF

  • 申请/专利权人 NORTHWESTERN UNIVERSITY;

    申请/专利号US201414449690

  • 申请日2014-08-01

  • 分类号H01L31/00;H01L29/861;H01L31/0336;H01L29/66;H01L31/109;H01L21/02;H01L29/06;

  • 国家 US

  • 入库时间 2022-08-21 14:34:10

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号