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Process for creating lithographically-defined plasmonic structures with enhanced Q factors
Process for creating lithographically-defined plasmonic structures with enhanced Q factors
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机译:具有增强的Q因子的光刻定义的等离激元结构的创建过程
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摘要
A method for plasmonic structure manufacture and for protecting a plasmonic nanostructure during annealing is provided. The method includes: lithographically forming a plasmonic nanostructure on a substrate; encapsulating the plasmonic nanostructure in high temperature resistant material; annealing the plasmonic nanostructure; and removing the high temperature resistant material to reveal the annealed plasmonic nanostructure.
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