首页>
外国专利>
PROCESS FOR CREATING LITHOGRAPHICALLY-DEFINED PLASMONIC STRUCTURES WITH ENHANCED Q FACTORS
PROCESS FOR CREATING LITHOGRAPHICALLY-DEFINED PLASMONIC STRUCTURES WITH ENHANCED Q FACTORS
展开▼
机译:用增强的Q因子创建由几何定义的等离子结构的过程
展开▼
页面导航
摘要
著录项
相似文献
摘要
10PROCESS FOR CREATING LITHOGRAPHICALLY-DEFINEDA method for plasmonic structure manufacture and for protecting a plasmonic nanostructure during annealing is provided. The method includes: lithographically forming a plasmonic nanostructure on a substrate; encapsulating the plasmonic nanostructure in high temperature resistant material; annealing the plasmonic nanostmcture; and removing the high temperature resistant material to reveal the annealed plasmonic nanostructure.FIGURE 1
展开▼