首页> 外国专利> Systems and methods for inhibiting contamination enhanced laser induced damage (CELID) based on fluorinated self-assembled monolayers disposed on optics

Systems and methods for inhibiting contamination enhanced laser induced damage (CELID) based on fluorinated self-assembled monolayers disposed on optics

机译:基于布置在光学器件上的氟化自组装单分子层,抑制污染增强的激光诱导损伤(CELID)的系统和方法

摘要

Embodiments of the present invention provide systems and methods for inhibiting contamination enhanced laser induced damage (CELID) based on fluorinated self-assembled monolayers (F-SAMs) disposed on optics. For example, a coating for inhibiting CELID to an optic disposed in a sealed gas environment or vacuum may include an F-SAM that includes a fluorinated hydrocarbon tail group covalently bound to the optic by a head group. The coating may be formed by heating the optic and a liquid-phase precursor of the F-SAM to generate a gas-phase precursor, and exposing the heated optic to the gas-phase precursor for a period of time sufficient for the gas-phase precursor to coalesce at and covalently bond to the optic and form the F-SAM. The optic may include silica, and the F-SAM may include a siloxane group covalently bound to the silica.
机译:本发明的实施例提供了基于布置在光学器件上的氟化自组装单层(F-SAM)来抑制污染增强的激光诱发损伤(CELID)的系统和方法。例如,用于抑制设置在密封的气体环境或真空中的光学器件的CELID的涂层可以包括F-SAM,该F-SAM包括通过头部基团共价结合到光学器件的氟化烃尾基。可以通过加热光学器件和F-SAM的液相前驱体以生成气相前驱体,并将加热后的光学器件暴露于气相前驱体中一段足以使气相汽相暴露的时间来形成涂层。聚结的前体在光学元件上共价键合并形成F-SAM。光学器件可以包括二氧化硅,并且F-SAM可以包括与二氧化硅共价结合的硅氧烷基团。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号