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Semiconductor power MOSFET device having a super-junction drift region

机译:具有超结漂移区的半导体功率MOSFET器件

摘要

A semiconductor device includes: a first conductivity type semiconductor substrate; and a plurality of second conductivity type semiconductor regions, the respective second conductivity type semiconductor regions being embedded in a plurality of stripe shaped trenches formed in the semiconductor substrate so that the respective second conductivity type semiconductor regions are extended in the row direction or the column direction in parallel with a first principal surface of the semiconductor substrate and are spaced in a fixed gap mutually. The semiconductor substrate and the plurality of the semiconductor regions are depleted by a depletion layer extended in the direction in parallel to the first principal surface from a plurality of pn junction interfaces, and the respective pn junction interfaces are formed between the semiconductor substrate and the plurality of the semiconductor regions.
机译:一种半导体器件,包括:第一导电型半导体衬底;以及第二半导体衬底。和多个第二导电类型半导体区域,各个第二导电类型半导体区域被嵌入形成在半导体衬底中的多个条形沟槽中,从而各个第二导电类型半导体区域在行方向或列方向上延伸。平行于半导体衬底的第一主表面并且彼此间隔固定的间隙。半导体基板和多个半导体区域被从多个pn结界面沿与第一主面平行的方向延伸的耗尽层耗尽,在半导体基板与多个pn结界面之间形成有各个pn结界面。半导体区域。

著录项

  • 公开/公告号US9231099B2

    专利类型

  • 公开/公告日2016-01-05

    原文格式PDF

  • 申请/专利权人 SHOJI HIGASHIDA;

    申请/专利号US200913140316

  • 发明设计人 SHOJI HIGASHIDA;

    申请日2009-11-27

  • 分类号H01L27/088;H01L21/8232;H01L29/78;H01L29/06;H01L29/66;H01L29/10;

  • 国家 US

  • 入库时间 2022-08-21 14:27:45

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