首页> 外国专利> 'Process and device for synthesizing by vapor chemical deposition a material, in particular the diamond and process for forming by chemical vapor deposition a si-ge semiconductor.'

'Process and device for synthesizing by vapor chemical deposition a material, in particular the diamond and process for forming by chemical vapor deposition a si-ge semiconductor.'

机译:“通过气相化学沉积合成材料,特别是金刚石的方法和装置,以及通过化学气相沉积形成硅锗半导体的方法。”

摘要

process and device for synthesizing by vapor chemical deposition a material, in particular the diamond and process for forming by chemical vapor deposition a semiconductor of type si-ge. a process for synthesizing by vapor chemical deposition (cvd) a material according to which a plasma is produced in a vacuum chamber in the vicinity of a substrate and whereby a carbon-bearing substance is introduced into the chamber and h 2 in order to produce in the chamber a gas comprising substances carrying reactive carbon atoms in the form of radicals or unsaturated molecules from which the synthesis of said material is carried out, and by the fact that the absorption and diffusion electromagnetic spectra The inelastic properties of the solid material to be synthesized are used to collect in these spectra the absorption frequencies that contribute to the reactions that lead to the formation of the solid material to be synthesized, and to the fact that energetic rays are produced in the form of a photon beam carrying amounts of energy determined by each of the frequencies corresponding to said absorption frequencies and d elastic fusion, which photon beam is injected into the plasma where, for energetic states of the solid material, an abortion of these photons having energy corresponding to these energetic states is performed by said carrier substance of the reactive carbon atoms.
机译:通过气相化学沉积合成材料,特别是金刚石的方法和装置,以及通过化学气相沉积形成硅锗类型半导体的方法。一种通过气相化学沉积(cvd)合成材料的方法,根据该材料,在真空室中在基板附近产生等离子体,并由此将含碳物质引入室和h 2中以产生腔室中的气体包含以自由基或不饱和分子形式携带反应性碳原子的物质,从​​该物质进行所述材料的合成,并通过吸收和扩散电磁光谱的事实来合成固体材料的非弹性性质用于在这些光谱中收集吸收频率,这些吸收频率有助于导致形成要合成的固体材料的反应,并导致高能射线以光子束的形式产生,其携带的能量由对应于所述吸收频率和d弹性融合的每个频率,该光子束被注入到plas中其中,对于固体材料的高能态,通过活性碳原子的所述载体物质来进行具有与这些高能态相对应的能量的这些光子的中止。

著录项

  • 公开/公告号BR112013002242A2

    专利类型

  • 公开/公告日2016-05-24

    原文格式PDF

  • 申请/专利权人 DIAROTECH;

    申请/专利号BR20131102242

  • 发明设计人 HORACIO TELLEZ OLIVA;

    申请日2011-08-01

  • 分类号C23C16/30;C23C16/27;C23C16/52;

  • 国家 BR

  • 入库时间 2022-08-21 14:27:20

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