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Process for the treatment of silicon tetrachloride or germanium tetrachloride contaminated with at least one compound containing hydrogen.

机译:处理被至少一种含氢化合物污染的四氯化硅或四氯化锗的方法。

摘要

Process and apparatus for the purification of silicon tetrachloride or germanium tetrachloride containing compounds of hydrogen.The present invention relates to a process for the purification of silicon tetrachloride or germanium tetrachloride contaminated with at least one compound containing hydrogen.In which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a manner view by means of a cold plasma and silicon tetrachloride or germanium tetrachloride purified is isolated from the phase which has been treated in this way.The present invention also relates to a device for carrying out the process of the invention, which comprises a storage unit and of vaporization for silicon tetrachloride or germanium (4.1 and 5.1), which is connected via a connecting line with the entry of the reactor ( 4.3 or 5.3) with the control unit (4.4 or 5.4) for the production of discharges dieletricamente delayed whose output leads through a tube, both directly and indirectly through at least another reactor (5.5) to a condensing unit (4.5 or 5.11) with a container to collect downstream (4.6 or 5.12) is conectad Through an output line (4.6.2 or 5.12.1) a distillation unit (4.8 or 5.13) and, if appropriate, is equipped with a feed line (4.6.1) to the unit (4.1).
机译:纯化含氢化合物的四氯化硅或四氯化锗的方法和设备。本发明涉及一种纯化被至少一种含氢化合物污染的四氯化硅或四氯化锗的方法。其中四氯化硅或四氯化锗通过冷等离子体以待处理的方式处理待纯化的物质,并从已经以这种方式处理的相中分离出纯化的四氯化硅或四氯化锗。本发明还涉及用于进行纯化的方法的装置。本发明包括一个储存单元和一个四氯化硅或锗的汽化单元(4.1和5.1),该储存单元通过一个连接管线与反应器(4.3或5.3)的入口与控制单元(4.4或5.4)相连。延迟放电的产生,其输出直接或间接通过导管通过至少一个反应器(5.5)到带有容器的冷凝单元(4.5或5.11)以收集下游(4.6或5.12),通过输出管线(4.6.2或5.12.1)将蒸馏单元(4.8或5.13)连接起来。 ),并在适当时为装置(4.1)配备了进料管线(4.6.1)。

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