首页> 外国专利> A PROCESS FOR PURIFYING TECHNICAL GRADE TRICHLOROSILANE OR TECHNICAL GRADE SILICON TETRACHLORIDE

A PROCESS FOR PURIFYING TECHNICAL GRADE TRICHLOROSILANE OR TECHNICAL GRADE SILICON TETRACHLORIDE

机译:提纯工艺级三氟硅氧烷或工艺级四氯化硅的方法

摘要

The invention concerns a process (and a corresponding plant) for the purification of trichlorosilane and/or silicon tetrachloride comprising the following steps of treating technical grade trichlorosilane and/or technical grade silicon tetrachloride: complexation of the boron impurities (trichloride BCD) and other metallic impurities by addition of diphenylthiocarbazone and/or triphenylchloromethane, with the formation of complex macromolecules having high boiling point, first column distillation of the complexation step products, wherein the complexed boron impurities, together with other metallic impurities are removed as bottoms, and second column distillation of the tops of the previous distillation, wherein electronic grade trichlorosilane (plus dichlorosilane possible present) and/or silicon tetrachloride are obtained as tops and phosphorus chlorides PCD and phosphorus containing compounds, arsenic chlorides AsCD and arsenic containing compounds, aluminium compounds, antimony compounds and in general all the present metals and metalloids compounds and carbo silanes compounds, having a certain residual amount of trichlorosilane and/or silicon tetrachloride, are obtained as bottoms.
机译:本发明涉及用于纯化三氯硅烷和/或四氯化硅的方法(和相应的设备),包括以下处理工业级三氯硅烷和/或工业级四氯化硅的步骤:硼杂质(三氯化物BCD)与其他金属的络合通过加入二苯基硫脲和/或三苯基氯甲烷形成高沸点的大分子复杂杂质,首先对络合步骤产物进行柱蒸馏,其中将络合的硼杂质与其他金属杂质作为塔底馏分除去,然后进行第二柱蒸馏蒸馏的塔顶馏出物,其中获得电子级三氯硅烷(可能存在二氯硅烷)和/或四氯化硅作为塔顶馏出物,并得到氯化磷PCD和含磷化合物,氯化砷AsCD和含砷化合物,铝化合物,锑化合物通常以1磅/磅的重量获得所有本发明的金属和准金属化合物和碳硅烷化合物,其具有一定残留量的三氯硅烷和/或四氯化硅作为底部产物。

著录项

  • 公开/公告号IN276554B

    专利类型

  • 公开/公告日2016-10-28

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN3611/DELNP/2007

  • 发明设计人 GIANFRANCO GHETTI;

    申请日2007-05-15

  • 分类号C01B33/107;

  • 国家 IN

  • 入库时间 2022-08-21 14:24:27

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