首页> 外国专利> PLASMONIC LIGHT ABSORBER, PLASMONIC PHOTOCATALYTIC SUBSTRATE INCLUDING SAME, AND METHOD OF MANUFACTURING SAME

PLASMONIC LIGHT ABSORBER, PLASMONIC PHOTOCATALYTIC SUBSTRATE INCLUDING SAME, AND METHOD OF MANUFACTURING SAME

机译:等离子体光吸收剂,包括其的等离子体光催化基质及其制造方法

摘要

The present invention relates to a plasmonic light absorber, a plasmonic photocatalytic substrate including same, and a method of manufacturing same and, more particularly, to a plasmonic light absorber characterized by comprising: a substrate; nano rods formed on the substrate and leaning in irregular directions; and a metal-containing thin film formed on the surfaces of the nano rods and the substrate, to a plasmonic photocatalytic substrate including same, and to a method of manufacturing same, wherein the nano rods, on which the metal-containing thin film is formed, form nano gaps of various sizes, for inducing surface plasmon resonance, together with adjacent nano rods. Thus, there is the effect of providing: a plasmonic light absorber capable of being manufactured to have a wide surface area and of absorbing light in a wide wavelength range at high efficiency, and a plasmonic catalytic substrate including same.
机译:等离子体吸收体,包括该等离子体吸收体的等离子体光催化基材及其制造方法,特别涉及一种等离子体吸收体。纳米棒形成在基底上并沿不规则方向倾斜;以及在纳米棒和基板的表面上形成的含金属薄膜,包括其的等离子体光催化基板及其制造方法,其中形成有含金属薄膜的纳米棒与相邻的纳米棒一起,形成各种尺寸的纳米间隙,以引起表面等离子体共振。因此,具有以下效果:提供能够制造成具有大的表面积并且能够高效地吸收宽波长范围内的光的等离子体吸收体以及包括该等离子体吸收体的等离子体催化基板。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号