TOPOLOGICAL INSULATOR SATURABLE ABSORBER MIRROR AND FABRICATING METHOD THEREFOR

摘要

A topological insulator saturable absorber mirror and a fabricating method therefor. The topological insulator saturable absorber mirror (6) comprises a base (101) and a topological insulator thin film (102) plated on the base (101). The fabricating method comprises the following steps: place a base (101) and a topological insulator target material in a vacuum chamber (S1); ionize the surface of the topological insulator target material to produce a plasma of the topological insulator, and the plasma deposits on the base (101) to form a topological insulator thin film (102) (S2); control deposition time and/or a deposition temperature to enable the topological insulator thin film (102) to have the needed thickness (S3). The topological insulator saturable absorber mirror (6) has a high damage threshold, a simple structure, low costs, high reliability and is suitable for mass production. Meanwhile, a mode locked fiber laser of the topological insulator saturable absorber mirror (6) has the advantages of high reliability and being suitable for achievement transformation.