METHOD FOR MANUFACTURING PATTERNED SILVER NANOWIRE TRANSPARENT ELECTRODE

摘要

The present invention relates to a method for manufacturing a patterned silver nanowire transparent electrode. The method comprises: a first step of forming a mask layer by laminating a patterned mask on a transparent substrate; a second step of forming a silver nanowire pattern by applying and drying a silver nanowire coating liquid to the opening portion on a mask layer formed by the pattern; and a third step of removing the mask. Accordingly, an etching process is not necessary. According to the present invention, it is possible to use a flexible substrate, an expensive device is not necessary, the manufacturing process is not complicated, and thus there is an advantage of cost reduction. Particularly, since the etching process is not performed at the time of forming a pattern, it is possible to prevent damage to a substrate in the etching process and a visual milky phenomenon caused by the remaining etching liquid contained in the silver nanowires, and it is possible to solve the problem of environmental hazards caused by using the etching liquid.;COPYRIGHT KIPO 2016