NOVEL RUTHENIUM COMPOUND, PRODUCTION METHOD THEREOF, PRECURSOR COMPOSITION FOR FILM DEPOSITION COMPRISING RUTHENIUM COMPOUND, AND FILM DEPOSITION METHOD USING PRECURSOR COMPOSITION

摘要

The present invention relates to a novel ruthenium compound represented by chemical formula 1, a method for producing the ruthenium compound, a precursor composition which is used for deposition of a ruthenium-containing film and comprises the ruthenium compound, and a method for depositing a ruthenium-containing film by using the precursor composition. In the chemical formula 1, R^1 to R^4 comprise hydrogen (H), or a linear or branched C_(1-5) alkyl group individually, and n is an integer from zero to three.;COPYRIGHT KIPO 2016