CAPACITANCE TESTING STRUCTURE AND CAPACITANCE TESTING METHOD FOR MONITORING THICKNESS OF DIELECTRIC FILM

摘要

The present invention relates to a capacitance testing structure and a capacitance testing method for monitoring the thickness of a dielectric film. The structure includes: a top polar plate comprising a first protruding part connected to a first test pad; and a bottom polar plate comprising a second protruding part connected to a second test pad. The monitoring dielectric film is arranged between the top polar plate and the bottom polar plate, and the top polar plate and the bottom polar plate are arranged to prevent a protruding part of the polar plate from overlapping a random part of another polar plate. The present invention provides the capacitance testing structure and the capacitance testing method for monitoring the thickness of the dielectric film, which can obtain an ideal capacitance value, and can monitor the thickness of the monitoring dielectric film precisely.;COPYRIGHT KIPO 2016