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MASKLESS EXPOSURE METHOD AND MASKLESS EXPOSURE DEVICE FOR PERFORMING THE EXPOSURE METHOD

机译:无痕曝光方法和无痕曝光装置

摘要

The present invention relates to a kind of maskless exposure method and maskless exposure device execution are identical. Maskless exposure device includes: platform, sample substrate setting; A kind of shaven head, light are exposed on substrate; Light source part provides light to optical head. The optical head is exposed to the distance that substrate uses averaged focus. The distance of averaged focus is divided substrate by multiple regions, measures the corresponding region of pinpointed focus distance, the corresponding region of the distance of average pinpointed focus. Maskless exposure method can reduce the display device of defect. ;The 2016 of copyright KIPO submissions
机译:本发明涉及一种无掩模曝光方法,其无掩模曝光装置的执行过程相同。无掩模曝光设备包括:平台,样品基板设置;一种剃头,光线暴露在基材上;光源部分为光学头提供光。光学头暴露于基板使用平均聚焦的距离。平均焦点距离被基板划分为多个区域,测量相应的精确聚焦距离区域,相应的平均精确聚焦距离区域。无掩模曝光方法可以减少显示装置的缺陷。 ; 2016年版权KIPO提交文件

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