PLASMA/CATALYST-INTEGRATED GAS REFORMING DEVICE HAVING DOUBLE-PIPE STRUCTURE AND METHOD FOR REFORMING THE GAS

摘要

The present invention relates to a plasma/catalyst-integrated gas reforming device having a double-pipe structure and a method of reforming gas using the same and, more specifically, to a gas reforming device for reforming a mix gas containing carbon dioxide and hydrocarbon into a synthesis gas containing hydrogen and carbon monooxide which includes: a gas supply for supplying the mix gas; a plasma torch mounted at a lower central axis of the gas supply; a plasma reactor mounted under the gas supply such that the plasma reactor has an open bottom to primarily reform the mix gas supplied from the gas supply by plasma reaction using plasma flame formed downwardly by the plasma torch; a catalyst reaction chamber mounted to surround an outer surface of the plasma reactor to conduct secondary reformation by catalyst reaction using the primarily reformed gas and heat which are generated in the plasma reactor and fed upwardly; and a gas discharge unit formed on the catalyst reaction chamber to discharge the secondarily reformed gas, wherein the reformed gas is a synthesis gas containing hydrogen and carbon monooxide.