The present invention relates to a reticle transmittance measurement method, a projection exposure device, and a projection exposure method. When a reticle is used in the first time, the reticle is actually put into a device, and the oblique measurement and the random measurement of the reticle are performed, thereby grasping the transmittance of the whole reticle by avoiding the danger of biased sampling even if the number of sampling is not increased. Moreover, the present invention allows the size of a measurement spot, which is normally fixed, to be varied and changes an incidence angle according to the size of the measurement spot, thereby obtaining the same effect.
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