首页> 外国专利> SILICENE MATERIAL LAYER AND ELECTRONIC DEVICE COMPRISING SAME

SILICENE MATERIAL LAYER AND ELECTRONIC DEVICE COMPRISING SAME

机译:相同的硅材料层和电子设备

摘要

To provide a switching element such as a transistor, disclosed are a silicene material layer and an electronic device including the same. The silicon material layer has a two-dimensional comb structure of silicon atoms and is formed with a single layer or a double layer. The silicon material layer may include a region which is doped with at least one among group 1, group 2, group 16, and group 17 and doped with at least one of p-type dopant or n-type dopant. The present invention may provide the electronic device which includes the silicene material layer, may have an intermediate layer on the silicene layer, a gate insulating layer, and a gate electrode layer, and includes a tin film transistor.;COPYRIGHT KIPO 2016
机译:为了提供诸如晶体管的开关元件,公开了硅材料层和包括该硅材料层的电子设备。硅材料层具有硅原子的二维梳状结构,并且形成有单层或双层。硅材料层可以包括掺杂有组1,组2,组16和组17中的至少一种并且掺杂有p型掺杂剂或n型掺杂剂中的至少一种的区域。本发明可以提供一种电子设备,该电子设备包括硅材料层,可以在硅层上具有中间层,栅极绝缘层和栅电极层,并且包括锡膜晶体管。COPYRIGHTKIPO 2016

著录项

  • 公开/公告号KR20160041625A

    专利类型

  • 公开/公告日2016-04-18

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20140135967

  • 发明设计人 OH YOUNG TEKKR;

    申请日2014-10-08

  • 分类号H01L29/778;H01L21/822;

  • 国家 KR

  • 入库时间 2022-08-21 14:14:41

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