SUPERHYODRPHOBIC-SUPERHYDROPHILIC PATTERNS FORMING APPARATUS AND SUPERHYODRPHOBIC-SUPERHYDROPHILIC PATTERNS FORMING METHOD FOR USING THEREOF

摘要

Disclosed is an apparatus for forming a superhyodrphobic-superhydrophilic pattern for improving quality of the superhyodrphobic-superhydrophilic pattern. The apparatus for forming a superhyodrphobic-superhydrophilic pattern according to an embodiment of the present invention includes: a chamber member formed with an inner space; a gas supply unit formed at one side of the chamber member to inject gas into the chamber member; a gas discharge unit formed at one side of the chamber member to discharge reaction gas; a support member disposed in the chamber member to allow a material to be safely placed thereon; an ultraviolet radiation member spaced apart from the support member to radiate ultraviolet rays having wavelengths of two regions or more; at least one reflection member disposed in the chamber member to allow the ultraviolet rays radiated from the ultraviolet radiation member to be concentrated upon the material; and a mask member spaced apart from the material to block a specific region of the material such that the ultraviolet rays radiated onto the material is partially blocked.