METHOD TO MANUFACTURE TiAlN COATING BY ICP COUPLED DC MAGNETRON SPUTTERING

摘要

The present invention provides a method to manufacture TiAlN coating of which a fine grain has a small size and a uniform surface. The present invention can manufacture a TiAlN coating by a DC magnetron sputtering method by controlling power of inductively coupled plasma (ICP). The method to manufacture the TiAlN coating by the DC magnetron sputtering method uses the ICP having power of 50-300 W.;COPYRIGHT KIPO 2016