DEVICE FOR PROTECTING SOURCE BUSHING IN SEMICONDUCTOR ION IMPLANTING FACILITIES

摘要

The present invention relates to an apparatus to protect a source bushing used for semiconductor ion implantation equipment. The apparatus to protect a source bushing of semiconductor ion implantation equipment according to an embodiment of the present invention comprises: a source head to receive a high voltage to generate ions; a source flange where a first side of the source head is fixated; a source liner separated apart from the source head and having a ground potential; a source chamber where the source liner is fixated and separated apart from the source flange; a source bushing of which both sides are fixated to the source chamber and source flange and made up of insulation material; an electro-head which is the opposite side of the first side of the source head and formed in a second side adjacent to the source liner; and a path extension member of which one side is fixated to the source liner, the other side is separated apart from the source flange to extend a path that contaminant generated at a location close to the electro-head reaches the source bushing.