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OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS COMPRISING SUCH OPTICAL ELEMENT AND METHOD FOR MAKING THE OPTICAL ELEMENT
OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS COMPRISING SUCH OPTICAL ELEMENT AND METHOD FOR MAKING THE OPTICAL ELEMENT
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机译:用于光刻设备的光学元件,包括这种光学元件的光刻设备和制造该光学元件的方法
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摘要
The The lithographic apparatus includes an optical element containing the carbon nanotube sheet set orientation. The optical element is about 20 to have an element thickness of 500 nm range, and has a transmittance of at least about 20% for EUV radiation having a wavelength in the range of about 1 to 20 nm under perpendicular irradiation of the EUV radiation. The carbon nanotube sheet bearing set may essentially be used as an optical element, it can be designed to reduce debris and, and / or improving the EUV / proportion of unwanted radiation does. The sheet does not necessarily require the support due to its strength. An optical element of the present invention can not be supported. ;
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