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OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS COMPRISING SUCH OPTICAL ELEMENT AND METHOD FOR MAKING THE OPTICAL ELEMENT

机译:用于光刻设备的光学元件,包括这种光学元件的光刻设备和制造该光学元件的方法

摘要

The The lithographic apparatus includes an optical element containing the carbon nanotube sheet set orientation. The optical element is about 20 to have an element thickness of 500 nm range, and has a transmittance of at least about 20% for EUV radiation having a wavelength in the range of about 1 to 20 nm under perpendicular irradiation of the EUV radiation. The carbon nanotube sheet bearing set may essentially be used as an optical element, it can be designed to reduce debris and, and / or improving the EUV / proportion of unwanted radiation does. The sheet does not necessarily require the support due to its strength. An optical element of the present invention can not be supported. ;
机译:光刻设备包括包含碳纳米管片组取向的光学元件。光学元件为约20以具有500nm范围的元件厚度,并且在EUV辐射的垂直辐射下对具有约1至20nm范围的波长的EUV辐射具有至少约20%的透射率。碳纳米管薄板轴承组可以基本上用作光学元件,可以设计成减少碎屑和/或提高EUV /有害辐射的比例。片材由于其强度而不一定需要支撑。不能支撑本发明的光学元件。 ;

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