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MANUFACTURING METHOD OF SUBSTRATE GRAPHENE GROWTH WITHOUT USING METAL CATALYST AND SUBSTRATE GRAPHENE GROWTH WITHOUT USING METAL CATALYST
MANUFACTURING METHOD OF SUBSTRATE GRAPHENE GROWTH WITHOUT USING METAL CATALYST AND SUBSTRATE GRAPHENE GROWTH WITHOUT USING METAL CATALYST
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机译:不使用金属催化剂的基质石墨烯生长的制造方法和不使用金属催化剂的基质石墨烯生长的制造方法
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摘要
A kind of method of the manufacturing method without growth graphene in the substrate of catalyst is provided, includes the following steps: (one) preparation without catalyst layer substrate; (2) etching gas of carbonaceous gas is provided, is carried out low pressure chemical vapor deposition (LPCVD); (3) supply etching gas works as supply carbonaceous gas without catalyst layer to grow graphene in no catalyst layer; D grows graphene in substrate, and saving bit by bit continuous removal institute in no catalyst, whether there is or not catalyst layers, and LPCVD process steps c is simultaneously continuously carried out by the etching gas. ;The 2016 of copyright KIPO submissions
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