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ETCHING SOLUTION COMPOSITION FOR MOLYBDENUM-BASED METAL LAYER OR ALUMINUM-BASED METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
ETCHING SOLUTION COMPOSITION FOR MOLYBDENUM-BASED METAL LAYER OR ALUMINUM-BASED METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
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机译:基于钼的金属层或基于铝的金属层的蚀刻溶液组成以及使用该溶液的液晶显示阵列基质的制造方法
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摘要
The present invention relates to the molybdenum base metal films or aluminum-based metal film of a kind of etchant, and the method for manufacturing the array substrate of liquid crystal display device uses. More particularly it relates to the molybdenum base metal film or aluminum-based metal film of a kind of etchant, including sodium peroxydisulfate, nitrogen, acetic acid, additive and water, and manufacture the method use of the array substrate of liquid crystal display device. Etchant of the invention, the etchant can control the etchant by reducing viscosity. ;The 2016 of copyright KIPO submissions
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