HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION

摘要

by using one or more of the helicon plasma source, the ion source capable of generating a high density the width of the wide ribbon ion beam is disclosed. In addition to the helicon plasma source (s), the ion source further includes a diffusion chamber. Diffusion chamber is oriented along the same axis with the cylindrical dielectric of the helicon plasma source has a fixed extraction opening. In one embodiment, the dual helicon plasma source located on the opposite ends of the diffusion chamber are utilized to produce a more uniform ion beam extraction. In yet another embodiment, it is used a multi-cusped magnetic field (multicusp magnetic field) in order to further enhance the uniformity of the extracted ion beam. ;