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HKMG FLASH MEMORY EMBEDDED WITH HKMG TECHNOLOGY

机译:HKMG内置HKMG闪存

摘要

integrated circuit structure includes a flash memory cell and MOS logic devices. Flash memory cells are floating gate dielectric, a floating gate, a control gate, a floating gate and an erase gate on the second side of the control a first word line, and a floating gate and a control gate on the side of the gate above the floating gate above the floating gate dielectric It included. The MOS logic device is a high dielectric constant (high-k) gate dielectric, and a high dielectric constant (high-k) gate dielectric, a gate electrode of the above. A gate electrode, a control gate, the word line, and the erase gate is formed of the same metal-containing material, which has a top surface with each other on the same plane.
机译:集成电路结构包括闪存单元和MOS逻辑器件。闪存单元是在控制第一字线的第二侧上的浮置栅极电介质,浮置栅极,控制栅极,浮置栅极和擦除栅极,以及在上方栅极侧的浮置栅极和控制栅极。浮栅介质上方的浮栅。 MOS逻辑器件是高介电常数(高k)栅极电介质,以及高介电常数(高k)栅极电介质,即上述的栅极。栅电极,控制栅,字线和擦除栅由相同的含金属的材料形成,该含金属的材料的顶表面彼此在同一平面上。

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