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SOL-GEL SOLUTION FOR USE IN FORMING FERROELECTRIC THIN FILM

机译:用于形成铁电薄膜的SOL-GEL解决方案

摘要

(Problem to be Solved) When forming a PZT ferroelectric thin film, one layer to be applied by a sol-gel method can be thickly applied, and after the preliminary firing and firing, the PZT film is formed into a cracky and dense film structure The present invention provides a sol-gel solution for forming a ferroelectric thin film. A sol-gel solution for forming a ferroelectric thin film includes a PZT-based compound, a polymer compound for adjusting viscosity containing polyvinylpyrrolidone, and an organic dopant containing a formamide-based solvent, wherein the PZT- , Wherein the molar ratio of the polyvinylpyrrolidone to the PZT-based compound in terms of the monomer is 1: 0.1 to 0.5 in terms of a monomer, and the formamide- By containing 3% by mass to 13% by mass of the gel solution, it is possible to increase the thickness of one layer to be applied at one time, to improve the production efficiency, and to enable the dense film formation after cracking and firing.
机译:(要解决的问题)在形成PZT铁电薄膜时,可以通过溶胶-凝胶法较厚地涂布一层,在预烧成和烧成后,PZT膜形成为裂纹状且致密的膜结构。本发明提供用于形成铁电薄膜的溶胶-凝胶溶液。用于形成铁电薄膜的溶胶-凝胶溶液包括:PZT-基化合物,用于调节粘度的高分子化合物和聚乙烯基吡咯烷酮,其中所述聚乙烯基吡咯烷酮用于调节粘度,其中PZT-,其中聚乙烯基吡咯烷酮的摩尔比。相对于PZT系化合物,以单体计为1:0.1〜0.5,以甲酰胺计。通过含有3质量%〜13质量%的凝胶溶液,可以增加厚度一次涂覆一层,以提高生产效率,并在破裂和烧制后能够形成致密的膜。

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