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METHOD OF PRODUCING CRYSTALLOGRAPHICALLY ALIGNED QUASI MONOCRYSTALLINE INTERMETALLIC THIN FILMS

机译:制作晶体图准准单晶间薄膜的方法

摘要

FIELD: physics.;SUBSTANCE: invention relates to physics of low-dimensional structures namely to a method of producing quasi monocrystalline intermetallic thin film of nano-sized structure, and can be used in different high-tech fields of industry and science for creating nano structured materials. On the glass substrate in vacuum at residual pressure of at least 10-5 torr copper and tin films are applied with layer thickness of 30-60 nm - up to six layers in total in sequence Cu/Sn/Cu/Sn/Cu/Sn and the chemical reaction between layers is conducted by relaxation annealing with moderate rate of 1 deg/s from room temperature to 600 °C in vacuum at residual pressure of at least 10-5 torr to obtain a column oriented structure in the film.;EFFECT: invention is aimed at obtaining crystallographically aligned quasi monocrystalline intermetallic thin films of Cu6Sn5.;1 cl, 9 dwg, 2 tbl, 5 ex
机译:技术领域本发明涉及低维结构的物理学,即涉及一种制备纳米结构的准单晶金属间化合物薄膜的方法,并且可以用于工业和科学的不同高科技领域中以产生纳米。结构化材料。在真空中,残留压力至少为10 -5 托的玻璃基板上,镀铜和锡膜,层厚为30-60 nm-依次最多覆盖六层Cu / Sn / Cu / Sn / Cu / Sn以及层间的化学反应是通过在室温下于真空中在残余压力至少为10 -5 6 Sn 5 .1 cl的晶体学取向准单晶金属间薄膜。 ,9载重吨,2汤匙,5前

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