首页> 外国专利> DIFFRACTION PERIODIC MICROSTRUCTURE BASED ON POROUS SILICON

DIFFRACTION PERIODIC MICROSTRUCTURE BASED ON POROUS SILICON

机译:基于多孔硅的衍射周期微结构

摘要

FIELD: chemistry.;SUBSTANCE: invention relates to diffraction periodic microstructures for visible range, based on porous silicon. In diffraction periodic microstructure based on porous silicon, comprising a substrate, made of monocrystalline silicon with a diffraction periodic microstructure, formed diffraction periodic microstructure based on porous silicon comprises ion-synthesised metal-containing nanoparticles, dispersed in surface region of substrate at layer thickness from 10 to 200 nm with metal concentration of 2.5·1020-6.5·1023 atoms/cm3.;EFFECT: technical effect consists in creation of a diffraction periodic microstructure based on porous silicon with different metal-containing nanoparticles.;1 cl, 20 dwg
机译:发明领域本发明涉及基于多孔硅的在可见光范围内的衍射周期性微结构。在基于多孔硅的衍射周期性微结构中,其包括由具有衍射周期性微结构的单晶硅制成的基板,基于多孔硅的形成的衍射周期性微结构包括离子合成的含金属的纳米颗粒,其以从层开始的层厚度分散在基板的表面区域中。 10至200 nm,金属浓度为2.5·10 20 -6.5·10 23 原子/ cm 3 .;效果:技术效果在于基于具有不同含金属纳米粒子的多孔硅的衍射周期性微结构的创建; 1 cl,20 dwg

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号