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Method of pinning domain walls in a nanowire magnetic memory device

机译:钉扎纳米线磁存储器件中的畴壁的方法

摘要

There is provided a method of pinning domain walls in a magnetic memory device (10) comprising using an antiferromagnetic material to create domain wall pinning sites. Junctions (22) where arrays of ferromagnetic nanowires (16) and antiferromagnetic nanowires (20) cross exhibit a permanent exchange bias interaction between the ferromagnetic material and the antiferromagnetic material which creates domain wall pinning sites. The exchange bias field is between 30 to 3600 Oe and the anisotropy direction of the ferromagnetic elements is between 15 to 75° to an anisotropy direction of the antiferromagnetic elements.
机译:提供了一种在磁存储器件(10)中钉扎畴壁的方法,该方法包括使用反铁磁材料来创建畴壁钉扎位置。铁磁纳米线(16)和反铁磁纳米线(20)交叉的交界处(22)在铁磁材料和反铁磁材料之间显示出永久的交换偏置相互作用,从而产生畴壁钉扎位点。交换偏置场在30至3600 Oe之间,铁磁元件的各向异性方向与反铁磁元件的各向异性方向在15至75°之间。

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