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CMOS compatible integrated dielectric optical waveguide coupler and fabrication

机译:CMOS兼容的集成介质光波导耦合器及其制造

摘要

An optoelectronic circuit fabrication method and integrated circuit apparatus fabricated therewith. Integrated circuits are fabricated with an integral optical coupling transition to efficiently couple optical energy from an optical fiber to an integrated optical waveguide on the integrated circuit. Layers of specific materials are deposited onto a semiconductor circuit to support etching of a trench to receive an optical coupler that performs proper impedance matching between an optical fiber and an on-circuit optical waveguide that extends part way into the transition channel. A silicon based dielectric that includes at least a portion with a refractive index substantially equal to a section of the optical fiber is deposited into the etched trench to create the optical coupler. Silicon based dielectrics with graded indices are also able to be used. Chemical mechanical polishing is used finalize preparation of the optical transition and integrated circuit.
机译:一种光电子电路的制造方法及其制造的集成电路装置。制造具有整体光耦合过渡的集成电路,以有效地将光能从光纤耦合到集成电路上的集成光波导。特定材料层沉积在半导体电路上,以支持沟槽蚀刻,以接收光耦合器,该耦合器在光纤和部分延伸到过渡通道的电路上光波导之间执行适当的阻抗匹配。将包括至少一部分折射率基本上等于光纤的一部分的硅基电介质沉积到蚀刻的沟槽中以产生光耦合器。也可以使用具有渐变折射率的硅基电介质。使用化学机械抛光来完成光学过渡和集成电路的制备。

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