首页> 外国专利> PERYLENE TETRACARBOXYLIC ACID BISIMIDE DERIVATIVE, n-TYPE SEMICONDUCTOR, PROCESS FOR PRODUCING n-TYPE SEMICONDUCTOR, AND ELECTRONIC DEVICE

PERYLENE TETRACARBOXYLIC ACID BISIMIDE DERIVATIVE, n-TYPE SEMICONDUCTOR, PROCESS FOR PRODUCING n-TYPE SEMICONDUCTOR, AND ELECTRONIC DEVICE

机译:丙二烯四羧酸二氨基化物衍生物,n型半导体,生产n型半导体的方法以及电子设备

摘要

The present invention provides a perylene tetracarboxylic acid bisimide derivative which enables the formation of an n-type semiconductor having high carrier mobility and has superior solubility. The perylene tetracarboxylic acid bisimide derivative is a perylene tetracarboxylic acid bisimide derivative represented by the following chemical formula (I), a tautomer or stereoisomer of the perylene tetracarboxylic acid bisimide derivative, or a salt of the perylene tetracarboxylic acid bisimide derivative or the tautomer or stereoisomer, In the chemical formula (I), R 1 to R 6 each represents a hydrogen atom, organooligosiloxane, or any substituent, at least one of R 1 to R 6 represents a monovalent substituent derived from organooligosiloxane, L 1 and L 2 each represents a single bond or a linking group, R 7 to R 10 each represents a lower alkyl group or a halogen, and o, p, q, and r each represents an integer from 0 to 2.
机译:本发明提供了能够形成载流子迁移率高且溶解性优异的n型半导体的a四羧酸双酰亚胺衍生物。 per四羧酸双酰亚胺衍生物是由以下化学式(I)表示的a四羧酸双酰亚胺衍生物,per四羧酸双酰亚胺衍生物的互变异构体或立体异构体,或the四羧酸双酰亚胺衍生物的盐或互变异构体或立体异构体。 ,在化学式(I)中,R 1至R 6各自表示氢原子,有机低聚硅氧烷或任何取代基,R 1至R 6中的至少一个表示衍生自有机低聚硅氧烷的单价取代基,L 1和L 2各自表示a。单键或连接基团,R 7至R 10各自代表低级烷基或卤素,并且o,p,q和r分别代表0至2的整数。

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