首页> 外国专利> DEVICE INCLUDING VERTICALLY ALIGNED TWO-DIMENSIONAL MATERIAL AND METHOD OF FORMING A VERTICALLY ALIGNED TWO-DIMENSIONAL MATERIAL

DEVICE INCLUDING VERTICALLY ALIGNED TWO-DIMENSIONAL MATERIAL AND METHOD OF FORMING A VERTICALLY ALIGNED TWO-DIMENSIONAL MATERIAL

机译:包括垂直对齐的二维材料的装置和形成垂直对齐的二维材料的方法

摘要

A transistor includes a substrate, a two-dimensional material including at least one layer that is substantially vertically aligned on the substrate such that an edge of the layer is on the substrate and the layer extends substantially vertical to the substrate, a source electrode and a drain electrode connected to opposite ends of the two-dimensional material, a gate insulation layer on the two-dimensional material between the source electrode and the drain electrode, and a gate electrode on the gate insulation layer. Each layer includes a semiconductor having a two-dimensional crystal structure.
机译:一种晶体管,包括:衬底;二维材料,包括至少一个在衬底上基本垂直排列的层,使得该层的边缘在衬底上,且该层基本垂直于衬底延伸,源电极和电极。漏极连接到二维材料的相对端,在源电极和漏电极之间的二维材料上的栅绝缘层,和在栅绝缘层上的栅电极。每一层包括具有二维晶体结构的半导体。

著录项

  • 公开/公告号EP3115484A1

    专利类型

  • 公开/公告日2017-01-11

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号EP20160155085

  • 申请日2016-02-10

  • 分类号C30B29/64;H01L21/02;H01L29/66;H01L29/778;H01L29/78;H01L29/786;H01L51;H01L51/05;H01L29/06;H01L29/12;H01L29/16;

  • 国家 EP

  • 入库时间 2022-08-21 14:04:04

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号