CONSTITUTING MEMBER FOR PLASMA PROCESSING SYSTEM SUCH AS EDGE RING HAVING HIGH-PURITY CHEMICAL VAPOR DEPOSITION (CVD) DIAMOND COATING CONTAINING sp3 BOND

摘要

PROBLEM TO BE SOLVED: To provide a pedestal having a cyclic edge ring bearable to plasma erosion over a long period.SOLUTION: A pedestal 20 for a plasma processing system has a substrate support surface, and a cyclic edge ring 80 is arranged around the periphery of the substrate support surface. A chemical vapor deposition (CVD) diamond coating 90 is arranged on a plasma exposure surface of the cyclic edge ring 80. The CVD diamond coating 90 contains sp3 bond, and the purity of the sp3 bond is higher than 90%.SELECTED DRAWING: Figure 3