首页> 外国专利> ELECTROPLATING BATH FOR FORMING POROUS CYLINDRICAL IRON GROUP ELEMENT PLATING FILM AND METHOD FOR FORMING POROUS CYLINDRICAL IRON GROUP ELEMENT PLATING FILM USING THE SAME

ELECTROPLATING BATH FOR FORMING POROUS CYLINDRICAL IRON GROUP ELEMENT PLATING FILM AND METHOD FOR FORMING POROUS CYLINDRICAL IRON GROUP ELEMENT PLATING FILM USING THE SAME

机译:用于形成多孔圆柱铁族元素镀膜的电镀浴以及使用该电镀浴形成多孔圆柱铁族元素镀膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a technology capable of increasing a specific surface area of an iron group element plating film.;SOLUTION: There are provided an electroplating bath for forming a porous cylindrical iron group element plating film by containing tertiary amine represented by the following formula (I), where R1 represents a linear or branched alkyl group having 1 to 6 carbon atoms, R2 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an aryl which may have a substituent, R3 represents an aryl group which may have a substituent into an iron group element plating bath, a method for forming the porous cylindrical iron group element plating film by electroplating at 0.5 to 4 A/dm2 for 10 min. or more using the same and the porous cylindrical iron group element plating film obtained thereby.;SELECTED DRAWING: Figure 2;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:提供一种能够增加铁族元素镀膜的比表面积的技术。解决方案:提供一种电镀液,其通过包含以下列方式表示的叔胺形成多孔圆柱形铁族元素镀膜:式(I),其中R 1 代表碳原子数为1至6的直链或支链烷基,R 2 代表碳原子数为1至6的直链或支链烷基碳原子或可以具有取代基的芳基,R 3 表示在铁族元素镀覆浴中可以具有取代基的芳基。以0.5至4 A / dm 2 电镀10分钟。 ;或更多使用相同的材​​料,并由此获得的多孔圆柱形铁族元素镀膜。;部分制图:图2;版权:(C)2018,JPO&INPIT

著录项

  • 公开/公告号JP2017193750A

    专利类型

  • 公开/公告日2017-10-26

    原文格式PDF

  • 申请/专利权人 JCU CORP;

    申请/专利号JP20160084509

  • 发明设计人 HORI MASAO;

    申请日2016-04-20

  • 分类号C25D3/20;C25D3/12;C25D5/16;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:03

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