ACTUATOR TO DYNAMICALLY ADJUST SHOWERHEAD TILT IN SEMICONDUCTOR PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a showerhead module adjustment mechanism which supports a showerhead module in a top plate of a semiconductor substrate processing apparatus, where a lower surface of the showerhead module is parallel to an upper surface of a substrate pedestal module.;SOLUTION: A showerhead module adjustment mechanism 400 is dynamically operable to adjust a planarization of a faceplate 316 of a showerhead module 211 with respect to an upper surface of a substrate pedestal module adjacent to the faceplate in a semiconductor substrate processing apparatus.;SELECTED DRAWING: Figure 3A;COPYRIGHT: (C)2017,JPO&INPIT