LASER-PRODUCED PLASMA EUV SOURCE WITH REDUCED DEBRIS GENERATION

摘要

PROBLEM TO BE SOLVED: To provide a method and apparatus for generating EUV light via laser produced plasma with reduced debris.SOLUTION: A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material by utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume by utilizing a second laser beam to produce a high-temperature plasma for EUV radiation.SELECTED DRAWING: Figure 1