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ORGANIC FILM MATERIAL, ORGANIC FILM FORMATION METHOD, PATTERN FORMATION METHOD, AND COMPOUND
ORGANIC FILM MATERIAL, ORGANIC FILM FORMATION METHOD, PATTERN FORMATION METHOD, AND COMPOUND
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机译：有机膜材料，有机膜形成方法，图案形成方法和化合物
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摘要
PROBLEM TO BE SOLVED: To provide an organic film material for forming an organic film having dry etching resistance and also having a high level of embedding/flattening properties.;SOLUTION: An organic film material comprises a compound represented by the formula (n1 and n2 are 0 or 1, W is a single bond or a structure represented by formula 2; R1 is a structure represented by formula 3; m1 and m2 are an integer of 0-7; Ra-Rf are H, alkyl or the like).;SELECTED DRAWING: None;COPYRIGHT: (C)2017,JPO&INPIT
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机译：解决的问题：提供一种用于形成有机膜材料的有机膜材料，该有机膜材料具有耐干蚀刻性并且还具有高水平的嵌入/平坦化性能。;解决方案：一种有机膜材料包含由式（n1和n2表示）的化合物是0或1，W是单键或由式2表示的结构; R 1 是由式3表示的结构; m1和m2是0-7的整数; R a -R f 是H，烷基等）.;选定的图纸：无;版权：（C）2017，JPO＆INPIT
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