MULTIFIELD OVERLAY CONTROL IN JET AND FLUSH IMPRINT LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a multifield overlay control method in jet and flush imprint lithography for realizing a 5 nm sub-overlay in multiple fields.SOLUTION: With one such technology, an overlay is reduced from the wafer side, by using a wafer thermal actuator. With other technology, topology of a template is optimized to allow for simultaneous reduction of overlays in the multiple fields of the template, by reducing inter-field mechanical coupling between a plurality of fields of the multiple fields of template. With the technology ahead, in order to achieve simultaneous implementation of single and multifield overlay, wafer thermal and template drive technologies are coupled.SELECTED DRAWING: None