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Method for producing a plasma etching apparatus for components and plasma etching equipment parts for
Method for producing a plasma etching apparatus for components and plasma etching equipment parts for
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机译:用于部件的等离子蚀刻设备的制造方法以及用于等离子蚀刻设备的部件
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摘要
The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 μm or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.
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