首页> 外国专利> Method for replacing plasma generating unit in negative ion source device and negative ion source device

Method for replacing plasma generating unit in negative ion source device and negative ion source device

机译:更换负离子源装置中的等离子体产生单元的方法和负离子源装置

摘要

PROBLEM TO BE SOLVED: To provide a negative ion source device which allows the replacement of a plasma generating part to be rapidly performed in a simple and handy manner.SOLUTION: A negative ion source device 100 comprises: a chamber 108 with a through-hole 108e provided therein; a gas-supply source 122 for supplying a material gas and an inert gas into the chamber 108; a plasma generating part 112 provided in the through-hole 108e for generating plasma by using the material gas supplied by the gas-supply source 122; a cesium supply source 118 for promoting the production of negative ions, and supplying cesium having reactivity with atmospheric air into the chamber 108; and a safety valve 126 for making control so that the pressure of the inert gas supplied into the chamber 108 from the gas-supply source 122 becomes higher than the pressure outside the chamber 108 on condition that the plasma generating part 112 is dismounted from the through-hole 108e.
机译:解决的问题:提供一种负离子源设备,该负离子源设备允许以简单且方便的方式快速进行等离子体产生部件的更换。解决方案:负离子源设备100包括:具有通孔的腔室108其中提供了108e;气体供给源122,其向腔室108内供给原料气体和惰性气体。在通孔108e上设置有等离子体产生部112,该等离子体产生部112利用由气体供给源122供给的原料气体产生等离子体。铯供应源118,用于促进负离子的产生,并将与大气反应的铯供应到腔室108中;安全阀126和控制阀使得在等离子体产生部112从通气口拆卸的条件下,从供气源122供应到腔室108中的惰性气体的压力变得高于腔室108外部的压力。孔108e。

著录项

  • 公开/公告号JP6203648B2

    专利类型

  • 公开/公告日2017-09-27

    原文格式PDF

  • 申请/专利权人 住友重機械工業株式会社;

    申请/专利号JP20140009326

  • 发明设计人 衞藤 晴彦;青木 康;

    申请日2014-01-22

  • 分类号H01J27/08;H01J37/08;

  • 国家 JP

  • 入库时间 2022-08-21 13:56:06

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